ASML’s latest machine powers new breakthroughs for logic and memory chips
Imec, a leading semiconductor research company based in Belgium, today announced a series of chipmaking breakthroughs at its joint lab with ASML. The lab opened its doors in June with the aim to provide ecosystem partners with early access to the High NA EUV prototype scanner. The High NA machine represents the latest advancement in extreme ultraviolet (EUV) lithography systems, which use light to draw chip patterns on silicon wafers. It’s ASML’s most high-end tool to date. Now, imec says that the use of the technology has already yielded impressive results. The first is the successful printing of circuit patterns…This story continues at The Next Web
Imec, a leading semiconductor research company based in Belgium, today announced a series of chipmaking breakthroughs at its joint lab with ASML. The lab opened its doors in June with the aim to provide ecosystem partners with early access to the High NA EUV prototype scanner. The High NA machine represents the latest advancement in extreme ultraviolet (EUV) lithography systems, which use light to draw chip patterns on silicon wafers. It’s ASML’s most high-end tool to date. Now, imec says that the use of the technology has already yielded impressive results. The first is the successful printing of circuit patterns…
This story continues at The Next Web